A novel reconfigurable RF switch based on ferroelectric hafnium oxide FeFET fabricated in 22 nm FDSOI technology

Research output: Contribution to book/Conference proceedings/Anthology/ReportConference contributionContributedpeer-review

Contributors

  • Sukhrob Abdulazhanov - , Fraunhofer Institute for Photonic Microsystems (Author)
  • Dang Khoa Huynh - , Fraunhofer Institute for Photonic Microsystems (Author)
  • Quang Huy Le - , Fraunhofer Institute for Photonic Microsystems (Author)
  • Thomas Kampfe - , Fraunhofer Institute for Photonic Microsystems (Author)
  • Gerald Gerlach - , Chair of Solid State Electronics (Author)

Abstract

This paper presents a novel type of ferroelectric field effect transistor (FeFET)-based RF switch with multiple finger structure fabricated in 22 ~nm FDSOI technology. The ability to adjust the threshold voltage non-volatile allows for a novel switch concept. The FeFET can operate at V_GS=\mathbf0, which reduces the necessity of bias-Tee configurations in the signal path. It combines the advantages of passive and active RF switches with low loss and low distortion. The devices were implemented in the common-source configuration and demonstrate a large memory window exceeding 2 ~V, as well as exceptional performance at mmWave frequencies. We determined a transit frequency \left(f_T\right) and maximum oscillation frequency (f_MAX) of 135GHz and 139GHz, respectively for a device with 16 fingers, 20 ~nm gate length, and 1 \mu m gate width.

Details

Original languageEnglish
Title of host publication2023 18th European Microwave Integrated Circuits Conference, EuMIC 2023
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages181-184
Number of pages4
ISBN (electronic)9782874870736
Publication statusPublished - 2023
Peer-reviewedYes

Publication series

SeriesEuropean Microwave Integrated Circuit Conference (EuMIC)

Conference

Title18th European Microwave Integrated Circuits Conference, EuMIC 2023
Duration18 - 19 September 2023
CityBerlin
CountryGermany

External IDs

ORCID /0000-0002-7062-9598/work/174430543

Keywords

Keywords

  • FDSOI, FeFET, ferroelectric, HfO2, HVT, LVT, memory window