X-Ray White Beam Interferences on Thin Crystals

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Abstract

Results of white beam X-ray interference measurements on almost perfect semiconductor wafers are presented. A specific measurement geometry allows for the investigation of diffraction effects on thin wafers down to at least 375 µm with a simple experimental setup (standard lab CT with microfocus X-ray tube). Furthermore, the dynamic diffraction effect of double refraction has been studied in detail for thicker samples. This might lead to a new wafer testing method as the observed dynamic effects are very sensible on crystal quality.

Details

OriginalspracheEnglisch
Aufsatznummer2100085
Seitenumfang7
FachzeitschriftCrystal Research and Technology
Jahrgang56
Ausgabenummer10
Frühes Online-Datum6 Aug. 2021
PublikationsstatusVeröffentlicht - Okt. 2021
Peer-Review-StatusJa

Externe IDs

Scopus 85111817961

Schlagworte

Schlagwörter

  • X-ray diffraction, X-ray inspection, wafer testing, white beam interferences