X-Ray White Beam Interferences on Thin Crystals
Publikation: Beitrag in Fachzeitschrift › Forschungsartikel › Beigetragen › Begutachtung
Beitragende
Abstract
Results of white beam X-ray interference measurements on almost perfect semiconductor wafers are presented. A specific measurement geometry allows for the investigation of diffraction effects on thin wafers down to at least 375 µm with a simple experimental setup (standard lab CT with microfocus X-ray tube). Furthermore, the dynamic diffraction effect of double refraction has been studied in detail for thicker samples. This might lead to a new wafer testing method as the observed dynamic effects are very sensible on crystal quality.
Details
Originalsprache | Englisch |
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Aufsatznummer | 2100085 |
Seitenumfang | 7 |
Fachzeitschrift | Crystal Research and Technology |
Jahrgang | 56 |
Ausgabenummer | 10 |
Frühes Online-Datum | 6 Aug. 2021 |
Publikationsstatus | Veröffentlicht - Okt. 2021 |
Peer-Review-Status | Ja |
Externe IDs
Scopus | 85111817961 |
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Schlagworte
ASJC Scopus Sachgebiete
Schlagwörter
- X-ray diffraction, X-ray inspection, wafer testing, white beam interferences