The Case for Ferroelectrics in Future Memory Devices
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Beitragende
Abstract
Ferroelectrics are an excellent material choice for realizing nonvolatile memories with low write power. Based on the readout procedure, three different ferroelectric memory concepts can be discriminated: FeRAM, FeFET and FTJ. In this paper, the applicability of the three different concepts towards the main memory application categories as well as the applicability towards non von-Neumann computing solutions is discussed.
Details
Originalsprache | Englisch |
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Titel | 2021 5th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2021 |
Herausgeber (Verlag) | IEEE, New York [u. a.] |
ISBN (elektronisch) | 978-1-7281-8176-9 |
ISBN (Print) | 978-1-7281-8177-6 |
Publikationsstatus | Veröffentlicht - 8 Apr. 2021 |
Peer-Review-Status | Ja |
Publikationsreihe
Reihe | IEEE Electron Devices Technology and Manufacturing Conference (EDTM) |
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Konferenz
Titel | 5th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2021 |
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Dauer | 8 - 11 April 2021 |
Stadt | Chengdu |
Land | China |
Externe IDs
ORCID | /0000-0003-3814-0378/work/142256263 |
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Schlagworte
ASJC Scopus Sachgebiete
Schlagwörter
- FeFET, FeRAM, Ferroelectrics, FTJ