The Case for Ferroelectrics in Future Memory Devices
Publikation: Beitrag in Buch/Konferenzbericht/Sammelband/Gutachten › Beitrag in Konferenzband › Beigetragen › Begutachtung
Beitragende
Abstract
Ferroelectrics are an excellent material choice for realizing nonvolatile memories with low write power. Based on the readout procedure, three different ferroelectric memory concepts can be discriminated: FeRAM, FeFET and FTJ. In this paper, the applicability of the three different concepts towards the main memory application categories as well as the applicability towards non von-Neumann computing solutions is discussed.
Details
| Originalsprache | Englisch |
|---|---|
| Titel | 2021 5th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2021 |
| Herausgeber (Verlag) | Institute of Electrical and Electronics Engineers (IEEE) |
| ISBN (elektronisch) | 978-1-7281-8176-9 |
| ISBN (Print) | 978-1-7281-8177-6 |
| Publikationsstatus | Veröffentlicht - 8 Apr. 2021 |
| Peer-Review-Status | Ja |
Publikationsreihe
| Reihe | IEEE Electron Devices Technology and Manufacturing Conference (EDTM) |
|---|
Konferenz
| Titel | 5th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2021 |
|---|---|
| Dauer | 8 - 11 April 2021 |
| Stadt | Chengdu |
| Land | China |
Externe IDs
| ORCID | /0000-0003-3814-0378/work/142256263 |
|---|
Schlagworte
ASJC Scopus Sachgebiete
Schlagwörter
- FeFET, FeRAM, Ferroelectrics, FTJ