Oxidation behaviour of Ti-Al-C films composed mainly of a Ti2AlC phase
Publikation: Beitrag in Fachzeitschrift › Forschungsartikel › Beigetragen › Begutachtung
Beitragende
Abstract
This paper addresses the oxidation behaviour of Ti-Al-C films composed mainly of a Ti2AlC phase. The films exhibited rather low oxidation rates at 600 and 700°C, with an oxygen-rich zone or a thin oxide layer appearing on the film surfaces. Much faster oxidation rates were observed at 800 and 900°C. The Ti2AlC phase was quickly consumed by oxidation. From the film surface to the inner zone, TiO2-rich layer, Al2O3-rich layer, and TiO2+Al2O3 mixed layer was observed, respectively. The oxidation mechanism of the Ti-Al-C film is discussed based on the experimental results.
Details
Originalsprache | Englisch |
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Seiten (von - bis) | 2948-2955 |
Seitenumfang | 8 |
Fachzeitschrift | Corrosion Science |
Jahrgang | 53 |
Ausgabenummer | 9 |
Publikationsstatus | Veröffentlicht - Sept. 2011 |
Peer-Review-Status | Ja |
Schlagworte
ASJC Scopus Sachgebiete
Schlagwörter
- A. Ceramic, A. Sputtered films, B. SEM, B. XRD, C. Oxidation