Optical Properties of Ferroelectric Films HfxZryO2 and La:HfxZryO2 according to Ellipsometry Data

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

  • V. N. Kruchinin - , RAS - Institute of Semiconductor Physics, Siberian Branch (Autor:in)
  • E. V. Spesivtsev - , RAS - Institute of Semiconductor Physics, Siberian Branch (Autor:in)
  • C. V. Rykhlitsky - , RAS - Institute of Semiconductor Physics, Siberian Branch (Autor:in)
  • V. A. Gritsenko - , RAS - Institute of Semiconductor Physics, Siberian Branch, Novosibirsk State University, Novosibirsk State Technical University (Autor:in)
  • F. Mehmood - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • T. Mikolajick - , Professur für Nanoelektronik, NaMLab - Nanoelectronic materials laboratory gGmbH, Technische Universität Dresden (Autor:in)
  • U. Schroeder - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)

Abstract

Abstract: Recently ferroelectric properties have been found in hafnia-based nanosized films. Such films are of the utmost interest for development of a universal memory, which combines the advantages of random access memory and flash memory. The paper studies optical properties of hafnia-zirconium oxide films H-fxZryO2 and lanthanum-alloyed hafnia-zirconium oxide films La:HfxZryO2. Fluctuations of thickness in HfxZryO2 do not exceed 3.5%, fluctuations of thickness in La:HfxZryO2 films—3.2%. Optical properties are analyzed based on effective-medium theory. According to effective-medium theory data, HfxZryO2 films contain 46% HfO2, 54% ZrO2, La:HfxZryO2 films contain 47.5% HfO2, 52.4% ZrO2, 2.5% La2O3.

Details

OriginalspracheEnglisch
Seiten (von - bis)550-553
Seitenumfang4
FachzeitschriftOptics and Spectroscopy
Jahrgang131
Ausgabenummer7
PublikationsstatusVeröffentlicht - Juli 2023
Peer-Review-StatusJa

Externe IDs

ORCID /0000-0003-3814-0378/work/163295401

Schlagworte

Schlagwörter

  • effective-medium theory, ferroelectric, refraction index, spectral ellipsometry