Off-state impact on FDSOI ring oscillator degradation under high voltage stress

Publikation: Beitrag in Buch/Konferenzbericht/Sammelband/GutachtenBeitrag in KonferenzbandBeigetragenBegutachtung

Beitragende

  • Jens Trommer - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • Viktor Havel - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • Talha Chohan - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • Furqan Mehmood - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • Stefan Slesazeck - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • Gernot Krause - , Global Foundries, Inc. (Autor:in)
  • Germain Bossu - , Global Foundries, Inc. (Autor:in)
  • Wafa Arfaoui - , Global Foundries, Inc. (Autor:in)
  • Armin Muhlhoff - , Global Foundries, Inc. (Autor:in)
  • T. Mikolajick - , Professur für Nanoelektronik, NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)

Abstract

The degradation predicted by classical DC reliability methods, such as bias temperature instability (BTI) and hot carrier injection (HCI), might not translate sufficiently to the AC conditions, which are relevant on the circuit level. The direct analysis of circuit level reliability is therefore an essential task for hardware qualification in the near future. Ring oscillators (RO) offer a good model system, where both BTI and HCI contribute to the degradation. In this work, it is qualitatively shown that the additional off-state stress plays a crucial role at very high stress voltages, beyond upper usage boundaries. To yield an accurate RO lifetime prediction a frequency measurement setup with high resolution is used, which can resolve small changes in frequency during stress near operation conditions. An ACDC conversion model is developed predicting the resulting frequency change based on DC input data. From the extrapolation to 10 years of circuit lifetime the model predicts a very low frequency degradation below 0.2% under nominal operation conditions, where the off-state has a minor influence.

Details

OriginalspracheEnglisch
Titel2018 IEEE International Integrated Reliability Workshop (IIRW)
Herausgeber (Verlag)Institute of Electrical and Electronics Engineers Inc.
Seitenumfang5
Band2018
ISBN (elektronisch)9781538660393, 978-1-5386-6037-9
ISBN (Print)978-1-5386-6040-9
PublikationsstatusVeröffentlicht - Okt. 2018
Peer-Review-StatusJa

Publikationsreihe

ReiheIEEE International Integrated Reliability Workshop (IIRW)
ISSN1930-8841

Konferenz

Titel2018 IEEE International Integrated Reliability Workshop
KurztitelIIRW 2018
Dauer7 - 11 Oktober 2018
OrtStanford Sierra Conference Center
StadtSouth Lake Tahoe
LandUSA/Vereinigte Staaten

Externe IDs

ORCID /0000-0003-3814-0378/work/142256270

Schlagworte

Schlagwörter

  • Bias temperature instability, Circuit reliability, FD-SOI, Hot carrier injection, Off-state, Ring oscillator