Nonvolatile multilevel resistive switching in Ar+ Irradiated BiFeO3 thin films

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

Abstract

Low-energy Ar+ ion irradiation has been applied to an Au/BiFeO3/Pt capacitor structure before deposition of the Au top electrode. The irradiated thin film exhibits multilevel resistive switching (RS) without detrimental resistance degradation, which makes the intermediate resistance states more distinguishable, as compared with the nonirradiated thin film. The stabilization of resistance states after irradiation is discussed based on the analysis of the conduction mechanism during the RS, which was investigated by means of temperature-dependent current-voltage measurement from room temperature to 423 K.

Details

OriginalspracheEnglisch
Aufsatznummer6381441
Seiten (von - bis)54-56
Seitenumfang3
Fachzeitschrift IEEE electron device letters : a publication of the IEEE Electron Devices Society
Jahrgang34
Ausgabenummer1
PublikationsstatusVeröffentlicht - 1 Jan. 2013
Peer-Review-StatusJa

Externe IDs

Scopus 84871756286
Ieee 10.1109/LED.2012.2227666

Schlagworte

Schlagwörter

  • Irradiation, rectifying, resistive switching (RS)