Modeling and simulation of electron injection during programming in Twin Flash™ devices based on energy transport and the non-local lucky electron concept

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

  • Rainer Hagenbeck - , Infineon Technologies AG (Autor:in)
  • S. Decker - , Infineon Technologies AG (Autor:in)
  • F. Lau - , Infineon Technologies AG (Autor:in)
  • P. Haibach - , Infineon Technologies AG (Autor:in)
  • J. M. Schley - , Infineon Technologies AG (Autor:in)
  • M. Isler - , Infineon Technologies AG (Autor:in)
  • T. Mikolajick - , Infineon Technologies AG (Autor:in)
  • G. Tempel - , Infineon Technologies AG (Autor:in)

Abstract

We present a simulation analysis of the transient evolution of the hot electron injection process during programming of a Twin Flash™ memory cell. The simulation model is based on the combination of a non-local lucky electron injection model and a hydrodynamic transport model. The time dependent local distribution of injected electrons is simulated iteratively and self-consistently. These results provide valuable physical insight in the Twin Flash™ programming operation.

Details

OriginalspracheEnglisch
Seiten (von - bis)239-242
Seitenumfang4
FachzeitschriftJournal of computational electronics
Jahrgang3
Ausgabenummer3-4
PublikationsstatusVeröffentlicht - Okt. 2004
Peer-Review-StatusJa
Extern publiziertJa

Externe IDs

ORCID /0000-0003-3814-0378/work/156338390

Schlagworte

Schlagwörter

  • Charge-trapping device, Hot-carrier injection, Modeling, Nonvolatile memory cell, Simulation