Method for separating a solid-state layer from a solid-state material

Publikation: Geistiges EigentumPatentanmeldung/Patent

Beitragende

  • Ralf Rieske - , Infineon Technologies AG (Erfinder:in)
  • Christian Beyer - (Erfinder:in)
  • Christoph Guenther - (Erfinder:in)
  • Jan Richter - (Erfinder:in)
  • Marko David Swoboda - , Infineon Technologies AG (Erfinder:in)
  • Siltectra GmbH

Abstract

A method for separating a solid-state layer from a solid-state material includes: moving the solid-state material relative to a laser processing system; successively emitting a plurality of laser beams from the laser processing system to the solid-state material to create modifications within the solid-state material; adjusting the laser processing system for defined focusing of the plurality of laser beams and/or for continuous adjustment of energy of the plurality of laser beams as a function of at least one parameter; and detaching the solid-state layer from the solid-state material in a region of the modifications.

Details

A method for separating a solid-state layer from a solid-state material includes: moving the solid-state material relative to a laser processing system; successively emitting a plurality of laser beams from the laser processing system to the solid-state material to create modifications within the solid-state material; adjusting the laser processing system for defined focusing of the plurality of laser beams and/or for continuous adjustment of energy of the plurality of laser beams as a function of at least one parameter; and detaching the solid-state layer from the solid-state material in a region of the modifications.

OriginalspracheEnglisch
IPC (Internationale Patentklassifikation)B28D 5/ 00 A I
VeröffentlichungsnummerUS2021299910
Anmeldedatum9 Juni 2021
Land/GebietUSA/Vereinigte Staaten
Prioritätsdatum9 Juni 2021
PrioritätsnummerUS202117343219
PublikationsstatusVeröffentlicht - 30 Sept. 2021
Extern publiziertJa
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Externe IDs

ORCID /0000-0003-2572-1149/work/208796500