Interplay between charge trapping and polarization switching in BEOL-compatible bilayer Ferroelectric Tunnel Junctions
Publikation: Beitrag in Fachzeitschrift › Forschungsartikel › Beigetragen › Begutachtung
Beitragende
Abstract
We here report a joint experimental and theoretical analysis of polarization switching in ferroelectric tunnel junctions. Our results show that the injection and trapping of charge into the ferroelectric-dielectric stack has a large influence on the polarization switching. Our results are relevant to the physical understanding and to the design of the devices, and for both memory and memristor applications.
Details
Originalsprache | Englisch |
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Seiten (von - bis) | 593-599 |
Seitenumfang | 7 |
Fachzeitschrift | IEEE journal of the Electron Devices Society |
Jahrgang | 10 |
Publikationsstatus | Veröffentlicht - 2022 |
Peer-Review-Status | Ja |
Externe IDs
Mendeley | 07e7e94d-f884-3026-b85d-8a1e5a077f9a |
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unpaywall | 10.1109/jeds.2022.3171217 |
WOS | 000836630300005 |
Scopus | 85129606970 |
ORCID | /0000-0003-3814-0378/work/142256122 |
Schlagworte
DFG-Fachsystematik nach Fachkollegium
ASJC Scopus Sachgebiete
Schlagwörter
- Dielectrics, Electrodes, FTJ, Ferroelectric tunnel junction, Films, HZO, Memristors, Switches, Tin, Tunneling, artificial intelligence, charge trapping, interfacial charge, neuromoprhic computing, polarization switching, synaptic memristor, Neuromoprhic Computing, Synaptic Memristor, Ferroelectric Tunnel Juction, Interfacial charge, Charge trapping, Polarization switching, Artificial Intelligence.