High throughput method for K0.5Na0.5NbO3 thin films preparation by chemical solution deposition
Publikation: Beitrag in Fachzeitschrift › Forschungsartikel › Beigetragen › Begutachtung
Beitragende
Abstract
A high throughput method for synthesis and characterization of ferroelectric thin film libraries prepared by chemical solution deposition was developed. With a throughput of over 100 samples of different composition/day, it is possible to screen vast composition fields in a manageable amount of time. The method was applied to films of the binary KNbO3-NaNbO3 system. Structured Pt/SiO2/Si wafers were used as substrates. Samples of 450 nm thickness with remarkable dielectric properties and pure perovskite phases were obtained by optimizing the composition with respect to the K/Na-ratio, and by identifying the ideal amount of alkali-metal excess added to the precursor solutions.
Details
| Originalsprache | Englisch |
|---|---|
| Seiten (von - bis) | 3785-3788 |
| Seitenumfang | 4 |
| Fachzeitschrift | Journal of the European Ceramic Society |
| Jahrgang | 27 |
| Ausgabenummer | 13-15 |
| Publikationsstatus | Veröffentlicht - 2007 |
| Peer-Review-Status | Ja |
Externe IDs
| ORCID | /0000-0002-2484-4158/work/175744103 |
|---|
Schlagworte
ASJC Scopus Sachgebiete
Schlagwörter
- Films, High throughput, Niobates, Sol-gel processes