Control of rectifying and resistive switching behavior in BiFeO3 thin films
Publikation: Beitrag in Fachzeitschrift › Forschungsartikel › Beigetragen › Begutachtung
Beitragende
Abstract
BiFeO3 thin films have been grown on Pt/Ti/SiO2/Si substrates with pulsed laser deposition using Au as the top electrode. The resistive switching property of the Au/BiFeO3/Pt stack has been significantly improved by carefully tuning the oxygen pressure during the growth, and a large switching ratio of ∼4500 has been achieved. The deposition pressure modifies the concentration of oxygen vacancies and the rectifying behavior of the Au/BiFeO3 junction, and consequently influences the resistive switching behavior of the whole stack. The switching takes place homogeneously over the entire electrode, and shows a long-term retention.
Details
Originalsprache | Englisch |
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Aufsatznummer | 095802 |
Fachzeitschrift | Applied physics express |
Jahrgang | 4 |
Ausgabenummer | 9 |
Publikationsstatus | Veröffentlicht - 7 Nov. 2011 |
Peer-Review-Status | Ja |
Extern publiziert | Ja |
Externe IDs
ORCID | /0000-0003-3814-0378/work/155840900 |
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