Circuit Polymorphism Enabled by RFET Devices Processed on Industrial FDSOI

Publikation: Beitrag in Buch/Konferenzbericht/Sammelband/GutachtenBeitrag in KonferenzbandBeigetragenBegutachtung

Beitragende

  • N. Bhattacharjee - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • G. Galderisi - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • Y. He - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • V. Sessi - , Global Foundries Dresden (Autor:in)
  • M. Drescher - , Global Foundries Dresden (Autor:in)
  • V. Havel - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • M. Zier - , Global Foundries Dresden (Autor:in)
  • M. Simon - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • K. Ruttloff - , Global Foundries Dresden (Autor:in)
  • K. Li - , Global Foundries Dresden (Autor:in)
  • A. Zeun - , Global Foundries Dresden (Autor:in)
  • A. S. Seidel - , Global Foundries Dresden (Autor:in)
  • C. Metze - , Global Foundries Dresden (Autor:in)
  • M. Grothe - , Global Foundries Dresden (Autor:in)
  • S. Jansen - , Global Foundries Dresden (Autor:in)
  • M. Wijvliet - , Technische Universität Dresden (Autor:in)
  • S. Rai - , Center for Advancing Electronics Dresden (cfaed), Professur für Prozessorentwurf (Prozessor Design) (cfaed) (Autor:in)
  • A. Kumar - , Professur für Prozessorentwurf (Prozessor Design) (cfaed), Center for Advancing Electronics Dresden (cfaed) (Autor:in)
  • S. Slesazeck - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • J. Hoentschel - , Global Foundries Dresden (Autor:in)
  • T. Mikolajick - , Professur für Nanoelektronik, NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • J. Trommer - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)

Abstract

We present three-independent-gate Reconfigurable Field Effect Transistors, processed on a 300 mm industrial platform. The devices, able to function as both n-type and p-type transistors, were built on a GlobalFoundries fully-depleted silicon-on-insulator technology, and show highest symmetry between the on-state currents of both polarity modes, as well as a clearly defined multi-VT behavior. Based on them, we show electrical transient measurements demonstrating the functionality of a highly reconfigurable logic gate, the RGATE, able to yield up to eight different logic functions using only four transistors. Furthermore, we developed a Verilog-A table model of the presented transistors, that we used to build a 2-bit adder/2-bit half subtract reconfigurable circuit demonstrating the functionality of a highly tiled, security-oriented architecture employing only RGATEs.

Details

OriginalspracheEnglisch
Titel9th IEEE Electron Devices Technology and Manufacturing Conference
Herausgeber (Verlag)Institute of Electrical and Electronics Engineers (IEEE)
Seitenumfang3
ISBN (elektronisch)979-8-3315-0416-8
PublikationsstatusVeröffentlicht - 2025
Peer-Review-StatusJa

Konferenz

Titel9th IEEE Electron Devices Technology and Manufacturing Conference
UntertitelShaping the Future with Innovations in Devices and Manufacturing
KurztitelEDTM 2025
Veranstaltungsnummer9
Dauer9 - 12 März 2025
Webseite
OrtHong Kong Science and Technology Park
StadtHong Kong
LandHongkong

Externe IDs

ORCID /0000-0003-3814-0378/work/190573181