Back-bias reconfigurable field effect transistor: A flexible add-on functionality for 22 nm FDSOI

Publikation: Beitrag in Buch/Konferenzbericht/Sammelband/GutachtenBeitrag in KonferenzbandBeigetragenBegutachtung

Beitragende

  • V. Sessi - , Global Foundries Dresden (Autor:in)
  • M. Simon - , Technische Universität Dresden (Autor:in)
  • Stefan Slesazeck - , Technische Universität Dresden (Autor:in)
  • M. Drescher - , Global Foundries Dresden (Autor:in)
  • H. Mulaosmanovic - , Technische Universität Dresden (Autor:in)
  • K. Li - , Global Foundries Dresden (Autor:in)
  • R. Binder - , Global Foundries Dresden (Autor:in)
  • S. Waidmann - , Global Foundries Dresden (Autor:in)
  • A. Zeun - , Global Foundries Dresden (Autor:in)
  • A. S. Pawlik - , Global Foundries Dresden (Autor:in)
  • D. Utess - , Global Foundries Dresden (Autor:in)
  • V. Gottleuber - , Global Foundries Dresden (Autor:in)
  • S. Muller - , Global Foundries Dresden (Autor:in)
  • K. Feldner - , Global Foundries Dresden (Autor:in)
  • A. Heinzig - , Professur für Nanoelektronik (Autor:in)
  • S. Dunkel - , Global Foundries Dresden (Autor:in)
  • S. Kolodinski - , Global Foundries Dresden (Autor:in)
  • T. Mikolajick - , Professur für Nanoelektronik, Technische Universität Dresden (Autor:in)
  • J. Trommer - , Technische Universität Dresden (Autor:in)
  • M. Wiatr - , Global Foundries Dresden (Autor:in)

Abstract

Here we present a highly scalable reconfigurable field effect transistor concept, which is capable of dynamically switching between p-type, n-type, and ambipolar operation modes by adaptively changing the applied back-bias. The devices are processed on full-scale 300 mm wafers and reach gate lengths down to 20 nm, integrable into a 22 nm FDSOI platform with only minor process modifications. We demonstrate symmetric IV characteristics of p- and n-program with Im/loFF ratio up to 103 at a VDD of 0.8 V, and propose an exploitation in hardware security. In arnbipolar mode, frequency multiplication requiring only a single transistor is experimentally demonstrated.

Details

OriginalspracheEnglisch
Titel2021 Silicon Nanoelectronics Workshop, SNW 2021
Herausgeber (Verlag)IEEE, New York [u. a.]
ISBN (elektronisch)9784863487819
PublikationsstatusVeröffentlicht - 2021
Peer-Review-StatusJa

Publikationsreihe

Reihe2021 Silicon Nanoelectronics Workshop (SNW)

Konferenz

Titel26th Silicon Nanoelectronics Workshop, SNW 2021
Dauer13 Juni 2021
StadtVirtual, Online
LandJapan

Externe IDs

ORCID /0000-0003-3814-0378/work/142256168