Wafer-Scale Growth of Sb2Te3Films via Low-Temperature Atomic Layer Deposition for Self-Powered Photodetectors

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

  • Jun Yang - , Professur für Metallische Werkstoffe und Metallphysik (gB/IFW), Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden (Autor:in)
  • Jianzhu Li - , Harbin Institute of Technology (Autor:in)
  • Amin Bahrami - , Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden (Autor:in)
  • Noushin Nasiri - , Macquarie University (Autor:in)
  • Sebastian Lehmann - , Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden (Autor:in)
  • Magdalena Ola Cichocka - , Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden (Autor:in)
  • Samik Mukherjee - , Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden (Autor:in)
  • Kornelius Nielsch - , Professur für Metallische Werkstoffe und Metallphysik (gB/IFW), Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden (Autor:in)

Abstract

In this work, we demonstrate the performance of a silicon-compatible, high-performance, and self-powered photodetector. A wide detection range from visible (405 nm) to near-infrared (1550 nm) light was enabled by the vertical p-n heterojunction between the p-type antimony telluride (Sb2Te3) thin film and the n-type silicon (Si) substrates. A Sb2Te3film with a good crystal quality, low density of extended defects, proper stoichiometry, p-type nature, and excellent uniformity across a 4 in. wafer was achieved by atomic layer deposition at 80 °C using (Et3Si)2Te and SbCl3as precursors. The processed photodetectors have a low dark current (∼20 pA), a high responsivity of (∼4.3 A/W at 405 nm and ∼150 mA/W at 1550 nm), a peak detectivity of ∼1.65 × 1014Jones, and a quick rise time of ∼98 μs under zero bias voltage. Density functional theory calculations reveal a narrow, near-direct, type-II band gap at the heterointerface that supports a strong built-in electric field leading to efficient separation of the photogenerated carriers. The devices have long-term air stability and efficient switching behavior even at elevated temperatures. These high-performance and self-powered p-Sb2Te3/n-Si heterojunction photodetectors have immense potential to become reliable technological building blocks for a plethora of innovative applications in next-generation optoelectronics, silicon-photonics, chip-level sensing, and detection.

Details

OriginalspracheEnglisch
Seiten (von - bis)54034-54043
Seitenumfang10
FachzeitschriftACS Applied Materials and Interfaces
Jahrgang14
Ausgabenummer48
PublikationsstatusVeröffentlicht - 7 Dez. 2022
Peer-Review-StatusJa

Externe IDs

PubMed 36383043

Schlagworte

ASJC Scopus Sachgebiete

Schlagwörter

  • atomic layer deposition, heterostructure photodetector, high responsivity, SbTethin film, self-powered