Verfahren zum Aufteilung eines Halbleiterwerkstücks
Publikation: Geistiges Eigentum › Patentanmeldung/Patent
Beitragende
Abstract
A method of splitting a semiconductor work piece includes: forming a separation zone within the semiconductor work piece, wherein forming the separation zone comprises modifying semiconductor material of the semiconductor work piece at a plurality of targeted positions within the separation zone in at least one physical property which increases thermo-mechanical stress within the separation zone relative to a remainder of the semiconductor work piece, wherein modifying the semiconductor material in one of the targeted positions comprises focusing at least two laser beams to the targeted position; and applying an external force or stress to the semiconductor work piece such that at least one crack propagates along the separation zone and the semiconductor work piece splits into two separate pieces. Additional work piece splitting techniques and techniques for compensating work piece deformation that occurs during the splitting process are also described.
Details
A method of splitting a semiconductor work piece includes: forming a separation zone within the semiconductor work piece, wherein forming the separation zone comprises modifying semiconductor material of the semiconductor work piece at a plurality of targeted positions within the separation zone in at least one physical property which increases thermo-mechanical stress within the separation zone relative to a remainder of the semiconductor work piece, wherein modifying the semiconductor material in one of the targeted positions comprises focusing at least two laser beams to the targeted position; and applying an external force or stress to the semiconductor work piece such that at least one crack propagates along the separation zone and the semiconductor work piece splits into two separate pieces. Additional work piece splitting techniques and techniques for compensating work piece deformation that occurs during the splitting process are also described.
| Originalsprache | Deutsch |
|---|---|
| IPC (Internationale Patentklassifikation) | H01L 21/ 78 A I |
| Veröffentlichungsnummer | EP4084054 |
| Anmeldedatum | 22 Apr. 2022 |
| Prioritätsdatum | 10 März 2022 |
| Prioritätsnummer | US202217691763 |
| Publikationsstatus | Veröffentlicht - 2 Nov. 2022 |
| Extern publiziert | Ja |
Externe IDs
| ORCID | /0000-0003-2572-1149/work/208796523 |
|---|