Proposed two-dimensional topological insulator in SiTe

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

  • Yandong Ma - , Universität Leipzig, Jacobs University Bremen (Autor:in)
  • Liangzhi Kou - , Queensland University of Technology (Autor:in)
  • Ying Dai - , Shandong University (Autor:in)
  • Thomas Heine - , Universität Leipzig, Jacobs University Bremen (Autor:in)

Abstract

The two-dimensional (2D) crystal SiTe is identified to be a 2D topological insulator (TI) with bulk band gap of 220 meV by means of first-principles calculations. The synthesis of 2D SiTe has been reported earlier [Phys. Status Solidi RRL 8, 302 (2014)10.1002/pssr.201409013] as part of a three-dimensional superlattice. The freestanding monolayer is thermally and dynamically stable and only weakly bound within the layered superlattice, offering the possibility of mechanical exfoliation. Our discovery of a topological signature with large band gap raises the expectation that the most apparent showstopper in experimental 2D TI research, the lack of stable materials exposing a quantum spin Hall effect at room temperature, can be overcome. This offers many laboratories an opportunity to participate in investigating exciting new phenomena in condensed matter physics, such as new quasiparticles and dissipationless spin transport.

Details

OriginalspracheEnglisch
Aufsatznummer201104
FachzeitschriftPhysical Review B
Jahrgang94
Ausgabenummer20
PublikationsstatusVeröffentlicht - 2016
Peer-Review-StatusJa
Extern publiziertJa