Mass-printed integrated circuits with enhanced performance using novel materials and concepts

Publikation: Beitrag in Buch/Konferenzbericht/Sammelband/GutachtenBeitrag in KonferenzbandBeigetragenBegutachtung

Beitragende

  • Georg C. Schmidt - , Technische Universität Chemnitz (Autor:in)
  • Maxi Bellmann - , Technische Universität Chemnitz (Autor:in)
  • Heiko Kempa - , Martin-Luther-Universität Halle-Wittenberg (Autor:in)
  • Mike Hambsch - , University of Queensland (Autor:in)
  • Kay Reuter - , Technische Universität Chemnitz (Autor:in)
  • Michael Stanel - , Technische Universität Chemnitz (Autor:in)
  • Arved C. Hübler - , Technische Universität Chemnitz (Autor:in)

Abstract

Printed electronics is a seminal technology for the production of simple disposable electronic products. In comparison to conventional silicon electronics it offers the possibility to use potentially cheap materials (e.g. polymers) which can be processed as solutions or dispersions by means of highly productive mass printing technologies. One main aim is the production of fully mass printed electronic circuits for the identification of single items, which should not cost more than one cent per tag. For the realization several challenges have to be clarified. On the one hand the performance of the - often organic - materials has to be increased in interaction with the used printing technologies. On the other hand the printing methods themselves have to be adapted and continuously improved. Alternatively, new approaches for the preparation of structured thin films have to be developed. This paper introduces a new technique for the production of source/drain electrodes with high resolution.

Details

OriginalspracheEnglisch
TitelChallenges in Roll-to-Roll (R2R) Fabrication for Electronics and Other Functionalities
Seiten25-30
Seitenumfang6
PublikationsstatusVeröffentlicht - 2011
Peer-Review-StatusJa
Extern publiziertJa

Publikationsreihe

ReiheMaterials Research Society Symposium Proceedings
Band1285
ISSN0272-9172

Konferenz

Titel2010 MRS Fall Meeting
Dauer29 November - 3 Dezember 2010
StadtBoston, MA
LandUSA/Vereinigte Staaten

Externe IDs

ORCID /0000-0002-8487-0972/work/151982573