Filamentary resistive switching in amorphous and polycrystalline Nb2O5 thin films

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

  • L. Berger - (Autor:in)
  • S. Jakschik - (Autor:in)
  • V. Klemm - (Autor:in)
  • H. Mahne - (Autor:in)
  • D. Martin - (Autor:in)
  • T. Mikolajick - , Professur für Nanoelektronik (Autor:in)
  • D. Rafaja - (Autor:in)
  • Stefan Slesazeck - (Autor:in)

Abstract

In this paper, the correlation between the crystallinity of reactively sputtered Nb 2O 5 layers on Pt bottom electrode and their resistive switching behavior was investigated. It was found that the amorphous phase can transformed to an orthorhombic phase by annealing in argon at 650°C. Smooth surfaces of the crystalline samples with RMS roughness of 1 nm were produced. By using the stack Al/Nb 2O 5/Pt a Schottky diode was produced and a barrier height of 1.0 eV for the argon annealed sample was found. For the amorphous sample, a Frenkel-Poole emission mechanism was found with the activation energy of 0.21 eV. After an electric forming process a filamentary resistive switching was observed for both types of samples.

Details

OriginalspracheEnglisch
Seiten (von - bis)73-77
FachzeitschriftSolid-state electronics
Jahrgang72
PublikationsstatusVeröffentlicht - 2012
Peer-Review-StatusJa

Externe IDs

Scopus 84860308558