Electronic depth profiles with atomic layer resolution from resonant soft x-ray reflectivity

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

  • M. Zwiebler - , Leibniz Institute for Solid State and Materials Research Dresden (Autor:in)
  • J. E. Hamann-Borrero - , Leibniz Institute for Solid State and Materials Research Dresden (Autor:in)
  • M. Vafaee - , Technische Universität Darmstadt (Autor:in)
  • P. Komissinskiy - , Technische Universität Darmstadt (Autor:in)
  • S. Macke - , University of British Columbia, Max-Planck-Institut für Festkörperforschung (Autor:in)
  • R. Sutarto - , University of Saskatchewan (Autor:in)
  • F. He - , University of Saskatchewan (Autor:in)
  • B. Büchner - , Professur für Experimentelle Festkörperphysik (gB/IFW), Leibniz Institute for Solid State and Materials Research Dresden (Autor:in)
  • G. A. Sawatzky - , University of British Columbia (Autor:in)
  • L. Alff - , Technische Universität Darmstadt (Autor:in)
  • J. Geck - , Leibniz Institute for Solid State and Materials Research Dresden (Autor:in)

Abstract

The analysis of x-ray reflectivity data from artificial heterostructures usually relies on the homogeneity of optical properties of the constituent materials. However, when the x-ray energy is tuned to the absorption edge of a particular resonant site, this assumption may no longer be appropriate. For samples realizing lattice planes with and without resonant sites, the corresponding regions containing the sites at resonance will have optical properties very different from regions without those sites. In this situation, models assuming homogeneous optical properties throughout the material can fail to describe the reflectivity adequately. As we show here, resonant soft x-ray reflectivity is sensitive to these variations, even though the wavelength is typically large as compared to the atomic distances over which the optical properties vary. We have therefore developed a scheme for analyzing resonant soft x-ray reflectivity data, which takes the atomic structure of a material into account by 'slicing' it into atomic planes with characteristic optical properties. Using LaSrMnO4 as an example, we discuss both the theoretical and experimental implications of this approach. Our analysis not only allows to determine important structural information such as interface terminations and stacking of atomic layers, but also enables to extract depth-resolved spectroscopic information with atomic resolution, thus enhancing the capability of the technique to study emergent phenomena at surfaces and interfaces.

Details

OriginalspracheEnglisch
Aufsatznummer083046
Seiten (von - bis)1-15
Seitenumfang15
FachzeitschriftNew journal of physics
Jahrgang17
Ausgabenummer8
PublikationsstatusElektronische Veröffentlichung vor Drucklegung - 24 Aug. 2015
Peer-Review-StatusJa

Externe IDs

ORCID /0000-0002-2438-0672/work/158767767

Schlagworte

ASJC Scopus Sachgebiete

Schlagwörter

  • oxides, reflectometry, thin films

Bibliotheksschlagworte