Effect of the stoichiometry of niobium oxide on the resistive switching of Nb2O5 based metal-insulator-metal stacks

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

  • F. Hanzig - , Technische Universität Bergakademie Freiberg (Autor:in)
  • H. Mähne - , Technische Universität Bergakademie Freiberg (Autor:in)
  • J. Veselý - , Technische Universität Bergakademie Freiberg, Karlsuniversität Prag (Autor:in)
  • H. Wylezich - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • S. Slesazeck - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • A. Leuteritz - , Technische Universität Bergakademie Freiberg (Autor:in)
  • M. Zschornak - , Technische Universität Bergakademie Freiberg (Autor:in)
  • M. Motylenko - , Technische Universität Bergakademie Freiberg (Autor:in)
  • V. Klemm - , Technische Universität Bergakademie Freiberg (Autor:in)
  • T. Mikolajick - , Professur für Nanoelektronik, NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • D. Rafaja - , Technische Universität Bergakademie Freiberg (Autor:in)

Abstract

The oxygen concentration profiles, which develop at the interfaces between niobium pentoxide and the Al or Pt electrode in a metal-insulator-metal stack, were investigated by means of the X-ray and electron energy loss spectroscopies in a scanning transmission electron microscope with high resolution. The contact between Al and Nb2O5 was found to facilitate diffusion of oxygen from Nb2O5 to the Al electrode and to support the formation of a thin aluminum oxide layer at the Nb2O5/Al interface. In contrast, almost no diffusion of oxygen from Nb2O5 was observed at the Nb2O5/Pt interface. Different extent of the oxygen diffusion correlates with the observed differences in the resistive switching of the Pt/Nb2O5/Al and Pt/Nb2O5/Pt stacks.

Details

OriginalspracheEnglisch
Seiten (von - bis)122-127
Seitenumfang6
FachzeitschriftJournal of electron spectroscopy and related phenomena
Jahrgang202
PublikationsstatusVeröffentlicht - 23 Juni 2015
Peer-Review-StatusJa

Externe IDs

ORCID /0000-0003-3814-0378/work/142256288

Schlagworte

Schlagwörter

  • Electron energy loss spectroscopy, Energy-dispersive X-ray spectroscopy, Metal-insulator-metal stack, Resistive switching effect, Transmission electron microscopy

Bibliotheksschlagworte