Effect of Process Pressure on Carbon-Based Thin Films Deposited by Cathodic Arc on Stainless Steel for Bipolar Plates
Publikation: Beitrag in Fachzeitschrift › Forschungsartikel › Beigetragen › Begutachtung
Beitragende
Abstract
In this study, three carbon-based coating variants were deposited onto stainless steel substrates, and the process pressure during the carbon layer deposition was varied. We conducted Raman spectroscopy, transmission electron microscopy, interfacial contact resistance measurements, and potentiodynamic polarization tests to examine the effect of the process pressure on the properties of the coatings. The structural characterization revealed that all specimens exhibit a highly sp2-bonded structure. However, some structural differences could also be identified. In the TEM cross-section images of the carbon layer variants, these structural differences could be observed. The carbon layer deposited at 0.98 Pa has some distortions in the mainly perpendicular graphitic structure, which agrees with the Raman results. Almost completely vertically oriented graphitic layers exhibit the 0.1 Pa coating variant with a d-spacing similar to pure graphite. Regarding the contact resistance, the process pressure has only minor influence. All coatings variants have very low resistance values below 3 m (Formula presented.) cm2, even at a compaction force of 50 N cm−2, which can be attributed to the graphite-like structure. The polarization tests show that the corrosion resistance increases with increasing process pressure. The best coating variant has a corrosion current density of approximately 10 (Formula presented.) A cm−2 and almost 10 (Formula presented.) A cm−2 at room temperature and 80 (Formula presented.) C, respectively.
Details
Originalsprache | Englisch |
---|---|
Aufsatznummer | 1962 |
Fachzeitschrift | Coatings |
Jahrgang | 13 |
Ausgabenummer | 11 |
Publikationsstatus | Veröffentlicht - Nov. 2023 |
Peer-Review-Status | Ja |
Schlagworte
ASJC Scopus Sachgebiete
Schlagwörter
- bipolar plate, carbon thin film, microstructure, physical vapor deposition, surface properties