Bulk Depolarization Fields as a Major Contributor to the Ferroelectric Reliability Performance in Lanthanum Doped Hf0.5Zr0.5O2 Capacitors

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

  • Furqan Mehmood - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • Michael Hoffmann - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • Patrick D. Lomenzo - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • Claudia Richter - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • Monica Materano - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • Thomas Mikolajick - , Professur für Nanoelektronik, NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • Uwe Schroeder - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)

Abstract

After the discovery of ferroelectricity in HfO2, many dopants have been incorporated into the material to improve the ferroelectric properties. The binary mixture of HfO2 and ZrO2, HfxZrx −1O2, showed the widest process window in terms of polarization, but other memory related aspects still need improvement. Recently, the co-doping of La into a mixed Hf0.5Zr0.5O2, La:HZO, was reported to improve the endurance properties further but the explanation spanning both structural and electrical characteristics of La:HZO and their interaction is still missing. In this work, an extensive study of La:HZO with La content ranging from 0 to 4.3 mol% is conducted and resultant stabilization of nonpolar tetragonal phase, coercive field reduction, endurance improvement, stronger retention loss, and less imprinted hysteresis loop is reported with increasing La concentration. The model simultaneously explaining the electrical and structural properties is presented. In ferroelectric capacitor structures, the depolarization fields originating from nonferroelectric layers at the metal/ferroelectric interface are discussed extensively in previous studies but, here, for the first time, the impact of depolarization fields from nonferroelectric regions in the bulk of the ferroelectric material is reported, which is an important element to explain all the observed trends.

Details

OriginalspracheEnglisch
Aufsatznummer1901180
FachzeitschriftAdvanced materials interfaces
Jahrgang6
Ausgabenummer21
PublikationsstatusVeröffentlicht - 1 Nov. 2019
Peer-Review-StatusJa

Externe IDs

ORCID /0000-0003-3814-0378/work/142256235

Schlagworte

ASJC Scopus Sachgebiete

Schlagwörter

  • depolarization fields, ferroelectrics, hafnium oxides, imprint, lanthanum